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SHIN Hyun Koock
SHIN Hyun Koock
Chairman, GO Element; Ph.D in Chemistry
Dirección de correo verificada de goelement.co.kr
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Chemistry of copper (I). beta.-diketonate complexes. 2. Synthesis, characterization, and physical properties of (. beta.-diketonato) copper (I) trimethylphosphine and bis …
HK Shin, KM Chi, J Farkas, MJ Hampden-Smith, TT Kodas, EN Duesler
Inorganic Chemistry 31 (3), 424-431, 1992
1201992
Hot-wall chemical vapor deposition of copper from copper (I) compounds. 2. Selective, low-temperature deposition of copper from copper (I). beta.-diketonate compounds,(. beta …
HK Shin, KM Chi, MJ Hampden-Smith, TT Kodas, JD Farr, M Paffett
Chemistry of materials 4 (4), 788-795, 1992
1101992
Chemical vapor deposition of copper from copper (I) trimethylphosphine compounds
MJ Hampden-Smith, TT Kodas, M Paffett, JD Farr, HK Shin
Chemistry of Materials 2 (6), 636-639, 1990
1101990
The chemistry of β-diketonate copper (I) compounds—III. The synthesis of (β-diketonate) Cu (1, 5-COD) compounds, the solid state structure and disproportionation of …
KM Chi, HK Shin, MJ Hampden-Smith, EN Duesler, TT Kodas
Polyhedron 10 (19), 2293-2299, 1991
961991
Selective low‐temperature chemical vapor deposition of copper from (hexafluoroacetylacetonato)copper(I)trimethylphosphine, (hfa)CuP(Me)3
TT Kodas, HK Shin, KM Chi, MJ Hampden‐Smith, JD Farr, M Paffett
Advanced Materials 3 (5), 246-248, 1991
771991
Synthesis and characterization of (. beta.-diketonato) copper (I) alkyne complexes: structural characterization of (hexafluoroacetylacetonato)(diphenylacetylene) copper (I)
KM Chi, HK Shin, MJ Hampden-Smith, TT Kodas, EN Duesler
Inorganic Chemistry 30 (23), 4293-4294, 1991
751991
Preparation of volatile, monomeric copper (I) β-diketonate complexes
HK Shin, MJ Hampden-Smith, EN Duesler, TT Kodas
Polyhedron 10 (6), 645-647, 1991
591991
Preparation of volatile, monomeric copper (I) β-diketonate complexes
HK Shin, MJ Hampden-Smith, EN Duesler, TT Kodas
Polyhedron 10 (6), 645-647, 1991
591991
MOCVD of Titanium Nitride from a New Precursor, Ti[N(CH3)C2H5]4
HK Shin, HJ Shin, JG Lee, SW Kang, BT Ahn
Chemistry of materials 9 (1), 76-80, 1997
561997
The chemistry of copper(I) β-diketonate compounds. Part V. Syntheses and characterization of (β-diketonate)CuLn species where L = PBu3, PPh3, and PCy3; n = 1 and 2; crystal and molecular structures of (acac)Cu(PCy …
HK Shin, MJ Hampden-Smith, EN Duesler, TT Kodas
Canadian Journal of Chemistry 70 (12), 2954-2966, 1992
491992
MJ Hampden-Smith, TT Kodas, MF Paffett and JD Farr
HK Shin, KM Chi
Angew. Chem. Advanced Materials 3, 246, 1991
441991
Chemical vapor deposition of copper with a new metalorganic source
ES Choi, SK Park, HK Shin, HH Lee
Applied physics letters 68 (7), 1017-1019, 1996
281996
Synthesis of volatile, fluorinated β-ketoiminato copper (I) complexes
HK Shin, MJ Hampden-Smith, TT Kodas, AL Rheingold
Journal of the Chemical Society, Chemical Communications, 217-219, 1992
281992
Synthesis of New Copper (I) pdDiketonate Compounds for CVD of Copper
HK Shin, KM Chi, MJ Hampden-Smith, TT Kodas, JD Farr, MF Paffeif
MRS Online Proceedings Library 204 (1), 421-426, 1990
191990
Precursor compounds for deposition of ceramic and metal films and preparation methods thereof
H Shin
US Patent App. 11/078,610, 2005
162005
Precursor compounds for metal oxide film deposition and methods of film deposition using the same
H Shin
US Patent App. 10/002,275, 2003
162003
Preparation of TaN thin film by H2 plasma assisted atomic layer deposition using tert-butylimino-tris-ethylmethylamino tantalum
DK Kim, BH Kim, HG Woo, DH Kim, HK Shin
Journal of nanoscience and nanotechnology 6 (11), 3392-3395, 2006
142006
Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same
H Shin, HJ Shin
US Patent 6,399,772, 2002
142002
Semiconductor International
A Hand
Jan, 2003
132003
Method for manufacturing a gate electrode of a MOS transistor
H Shin, KC Park, J Moon, T Shim
US Patent 5,501,995, 1996
111996
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Artículos 1–20